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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD: Difference between revisions

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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,317 edits
Line 91: Line 91:
{| border="1" style="text-align: center; width: 700px; height: 150px;"
{| border="1" style="text-align: center; width: 700px; height: 150px;"
! colspan="2" style="text-align: left;" style="background: #efefef;" | 1STOxide  
! colspan="2" style="text-align: left;" style="background: #efefef;" | 1STOxide  
! colspan="2" style="text-align: left;" style="background: #efefef;" | A test recipe
! colspan="2" style="text-align: left;" style="background: #efefef;" | 1Oxide (A test recipe)
|-
|-
!N<math>_2</math>-flow
!N<math>_2</math>-flow
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