Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD: Difference between revisions
| Line 241: | Line 241: | ||
|} | |} | ||
[[File:PECVD2_RI_vs_B-P_graph.jpg]] | [[File:PECVD2_RI_vs_B-P_graph.jpg]] | ||
<br clear="all" /> | <br clear="all" /> | ||