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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD: Difference between revisions

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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
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==BPSG: RI vs. B/P ==
==BPSG: RI vs. B/P ==
B2H6 flow and PH3 flow was varied to map the RI of different B2H6/PH3 ratios. <br>
''Work done by BGHE@danchip in fall 2013'' <br>
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