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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD: Difference between revisions

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==BPSG: RI vs. B/P ==
==BPSG: RI vs. B/P ==
{| border="1" cellspacing="0" cellpadding="7"
|-
|Recipe name
|SiH4 flow [sccm]
|N<sub>2</sub>O flow [sccm]
|N2 flow [sccm]
|B2H6 flow [sccm]
|PH3 flow [sccm]
|Pressure [mTorr]
|Power [W]
|Description
|-
|1PBSG
|17
|1600
|0
|See below
|See below
|500
|800LF
|BPSG glass for waveguide cladding layer
|}
LF=Low Frequency
{| border="1" style="text-align: center; width: 400px; height: 150px;"
{| border="1" style="text-align: center; width: 400px; height: 150px;"
|-
|-
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