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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD: Difference between revisions

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=Recipes on PECVD2 for deposition of silicon oxides=
=Recipes on PECVD2 for deposition of silicon oxides=
See [[Specific Process Knowledge/III-V Process/thin film dep/pecvd2| here]]
See [[Specific Process Knowledge/III-V Process/thin film dep/pecvd2| here]]
=Recipes on PECVD1 for deposition of silicon oxides <span style="color:Red">Expired!</span>=
===Recipes===
{| border="1" cellspacing="0" cellpadding="7"
|-
|Recipe name
|SiH4 flow [sccm]
|N<sub>2</sub>O flow [sccm]
|N2 flow [sccm]
|B2H6 flow [sccm]
|PH3 flow [sccm]
|GeH4*100 flow [sccm]
|Pressure [mTorr]
|Power [W]
|Description
|-
|1oxide/1ox_std/standard
|17
|1600
|0
|0
|0
|0
|400
|380LF
|Process control recipe. Developed for waveguides
|-
|1PBSG
|17
|1600
|0
|135
|40
|0
|500
|800LF
|Developed for waveguide top cladding by ''Haiyan Ou @DTU Photonics'.
|-
|BGE_PBSG
|17
|1600
|0
|240
|60
|0
|500
|800LF
|Low stress PBSG
|-
|HO_core
|17
|1600
|300
|0
|0
|400
|400
|600LF
|Developed by Haiyan Ou @fotonik@dtu
|-
|HO_top
|17
|1600
|0
|107
|40
|0
|500
|800LF
|Developed by Haiyan Ou @fotonik@dtu
|-
|}
===Expected results===
{| border="1" cellspacing="0" cellpadding="5"
|-
|Recipe name
|Deposition rate [µm/min]
|RI
|Uniformity [%]
|Comments
|-
|1oxide/1ox_std/standard
|~0.193
|1.46
|2
|The latest measured values can be seen in the process control sheet in LabManager
|-
|1PBSG
|~0.3
|1.458@633nm
|
|
|-
|}


=Recipes on PECVD3 for deposition of silicon oxides=
=Recipes on PECVD3 for deposition of silicon oxides=
Line 261: Line 165:
|~248 nm/min
|~248 nm/min
|~1.458  
|~1.458  
|}
=Recipes on PECVD1 for deposition of silicon oxides <span style="color:Red">Expired!</span>=
===Recipes===
{| border="1" cellspacing="0" cellpadding="7"
|-
|Recipe name
|SiH4 flow [sccm]
|N<sub>2</sub>O flow [sccm]
|N2 flow [sccm]
|B2H6 flow [sccm]
|PH3 flow [sccm]
|GeH4*100 flow [sccm]
|Pressure [mTorr]
|Power [W]
|Description
|-
|1oxide/1ox_std/standard
|17
|1600
|0
|0
|0
|0
|400
|380LF
|Process control recipe. Developed for waveguides
|-
|1PBSG
|17
|1600
|0
|135
|40
|0
|500
|800LF
|Developed for waveguide top cladding by ''Haiyan Ou @DTU Photonics'.
|-
|BGE_PBSG
|17
|1600
|0
|240
|60
|0
|500
|800LF
|Low stress PBSG
|-
|HO_core
|17
|1600
|300
|0
|0
|400
|400
|600LF
|Developed by Haiyan Ou @fotonik@dtu
|-
|HO_top
|17
|1600
|0
|107
|40
|0
|500
|800LF
|Developed by Haiyan Ou @fotonik@dtu
|-
|}
===Expected results===
{| border="1" cellspacing="0" cellpadding="5"
|-
|Recipe name
|Deposition rate [µm/min]
|RI
|Uniformity [%]
|Comments
|-
|1oxide/1ox_std/standard
|~0.193
|1.46
|2
|The latest measured values can be seen in the process control sheet in LabManager
|-
|1PBSG
|~0.3
|1.458@633nm
|
|
|-
|}
|}
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