Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/nano/Sinano32: Difference between revisions
Created page with "== The Sinano3.2 recipe == {| border="2" cellpadding="2" cellspacing="1" |+ '''Recipe Sinano3.2''' |- ! rowspan="6" align="center"| Recipe | Gas | BCl<sub>3</sub> 5 sccm, HB..." |
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| 180 nm zep etched down to 110 nm | | The [[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/nano/nanoetch/180nmzep|180 nm zep resist]] etched down to 110 nm | ||
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