Specific Process Knowledge/Thermal Process/A3 Phosphor Drive-in furnace: Difference between revisions
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==A3 Furnace Phosphor drive-in== | ==A3 Furnace Phosphor drive-in== | ||
[[Image:A3helstak.jpg|thumb|300x300px|A3 | [[Image:A3helstak.jpg|thumb|300x300px|A3 Phosphor drive-in furnace: positioned in cleanroom 2]] | ||
The A3 Furnace Phosphor drive-in is a Tempress horizontal furnace for oxidation of silicon wafers, annealing of the grown oxide and drive-in of phosphorus after a pre-deposition. Phosphorus pre-deposition takes place in the A4 Furnace Phosphor pre-dep. The A3 furnace can also be used for drive-in of phosphorus which has been ion implanted. | The A3 Furnace Phosphor drive-in is a Tempress horizontal furnace for oxidation of silicon wafers, annealing of the grown oxide and drive-in of phosphorus after a pre-deposition. Phosphorus pre-deposition takes place in the A4 Furnace Phosphor pre-dep. The A3 furnace can also be used for drive-in of phosphorus which has been ion implanted. | ||