Specific Process Knowledge/Thermal Process/Dope with Phosphorus: Difference between revisions

From LabAdviser
Jump to navigation Jump to search
No edit summary
Line 4: Line 4:
== In preparation ==
== In preparation ==
'''
'''
=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]=
<!--
=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Bge-Under construction.jpg|200px]]=
-->

Revision as of 15:47, 22 February 2013

The furnace A4 phosphorus predep(N-predep) can be used to predeposit silicon wafers with phosphor. The silicon wafers are positioned in a quarts boat. Phosphor is predeposited in the silicon wafers.

In preparation

THIS PAGE IS UNDER CONSTRUCTIONUnder construction.png