Specific Process Knowledge/Thermal Process/Dope with Phosphorus: Difference between revisions
No edit summary |
|||
| Line 4: | Line 4: | ||
== In preparation == | == In preparation == | ||
''' | ''' | ||
=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]= | |||
<!-- | |||
=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Bge-Under construction.jpg|200px]]= | |||
--> | |||
Revision as of 14:47, 22 February 2013
The furnace A4 phosphorus predep(N-predep) can be used to predeposit silicon wafers with phosphor. The silicon wafers are positioned in a quarts boat. Phosphor is predeposited in the silicon wafers.
In preparation
