Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD: Difference between revisions
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|500 | |500 | ||
|800LF | |800LF | ||
|Developed for waveguide top cladding by ''Haiyan Ou @DTU Photonics' | |Developed for waveguide top cladding by ''Haiyan Ou @DTU Photonics'. | ||
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|BGE_PBSG | |BGE_PBSG | ||
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|600 LF | |600 LF | ||
|Process for germanium doped core layer developed by Haiyan Ou from DTU Photonics | |Process for germanium doped core layer developed by Haiyan Ou from DTU Photonics | ||
Annnealing: Anneal bond furnace, recipe "core1100" | |||
|- | |- | ||
|Top-BPSG | |Top-BPSG | ||
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|800 LF | |800 LF | ||
|Process for PBSG top clading layer developed by Haiyan Ou from DTU Photonics | |Process for PBSG top clading layer developed by Haiyan Ou from DTU Photonics | ||
Annnealing/oxidation: Anneal bond furnace, recipe "clad1000" | |||
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