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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/UVExposure click here]'''


[[Category: Equipment|Lithography exposure]]
[[Category: Equipment|Lithography exposure]]
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=UV Exposure Comparison Table=
=UV Exposure Comparison Table=
 
{| class="wikitable"
 
|-
{|border="1" cellspacing="1" cellpadding="10" style="text-align:left;"
!
 
! [[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MA6-1|Aligner: MA6-1]]
!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment
! [[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MA6-2|Aligner: MA6-2]]
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MA6-1|Aligner: MA6-1]]</b>
! [[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA1|Aligner: Maskless 01]]
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MA6-2|Aligner: MA6-2]]</b>
! [[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA2|Aligner: Maskless 02]]
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA1|Aligner: Maskless 01]]</b>
! [[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA3|Aligner: Maskless 03]]
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA2|Aligner: Maskless 02]]</b>
! [[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA4|Aligner: Maskless 04]]
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA3|Aligner: Maskless 03]]</b>
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA4|Aligner: Maskless 04]]</b>
 
|-
|-
!style="background:silver; width:100px; color:black;" align="center"|Purpose  
! scope=row| Purpose
|style="background:LightGrey; color:black"|
|
|style="background:WhiteSmoke; color:black"|
*Top side alignment
*Top Side Alignment
*Back side alignment
*Back Side Alignment
*UV exposure
*UV exposure
OBS: this tool is in PolyFabLab
NB: this tool is in PolyFabLab
|style="background:WhiteSmoke; color:black"|
|
*Top Side Alignment
*Top side alignment
*Back Side Alignment
*Back side alignment
*UV exposure
*UV exposure
*(DUV exposure)
*Bond alignment
*Bond alignment
|style="background:WhiteSmoke; color:black"|
|
*Top Side Alignment
*Top side alignment
*Maskless UV exposure
*Maskless UV exposure
|style="background:WhiteSmoke; color:black"|
|
*Top Side Alignment
*Top side alignment
*Back Side Alignment
*Back side alignment
*Maskless UV exposure
*Maskless UV exposure
|style="background:WhiteSmoke; color:black"|
|
*Top Side Alignment
*Top side alignment
*Back Side Alignment
*Back side alignment
*Maskless UV exposure
*Maskless UV exposure
|style="background:WhiteSmoke; color:black"|
|
*Top Side Alignment
*Top side alignment
*Maskless UV exposure
*Maskless UV exposure
*Direct laser writing
*Direct laser writing
OBS: this tool is in PolyFabLab
NB: this tool is in PolyFabLab
 
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="4"|Performance
! scope=row| Minimum feature size
|style="background:LightGrey; color:black"|Minimum feature size
| ~1 µm || ~1 µm || ~1 µm || ~1 µm || ~1 µm || ~1 µm
|style="background:WhiteSmoke; color:black"|
~1 µm
|style="background:WhiteSmoke; color:black"|
~1 µm
|style="background:WhiteSmoke; color:black"|
~1 µm
|style="background:WhiteSmoke; color:black"|
~1 µm
|style="background:WhiteSmoke; color:black"|
~1 µm
|style="background:WhiteSmoke; color:black"|
~1 µm
 
|-
|-
|style="background:LightGrey; color:black"|Alignment accuracy
! scope=row| Alignment accuracy
|style="background:WhiteSmoke; color:black"|
|
*TSA: ±2 µm
*TSA: ±2 µm
*BSA: ±5 µm
*BSA: ±5 µm
|style="background:WhiteSmoke; color:black"|
|
*TSA: ±1 µm
*TSA: ±1 µm
*BSA: ±2 µm
*BSA: ±2 µm
|style="background:WhiteSmoke; color:black"|
|
±2 µm<br>(±1 µm possible)
±2 µm<br>(±1 µm possible)
|style="background:WhiteSmoke; color:black"|
|
*TSA: ± 0.5 µm
*TSA: ± 0.5 µm
*BSA: ± 1 µm
*BSA: ± 1 µm
|style="background:WhiteSmoke; color:black"|
|
*TSA: ± 0.5 µm
*TSA: ± 0.5 µm
*BSA: ± 1 µm
*BSA: ± 1 µm
|style="background:WhiteSmoke; color:black"|
|
±1 µm
±1 µm
|-
|-
|style="background:LightGrey; color:black"|Exposure light
! scope=row| Exposure light source
|style="background:WhiteSmoke; color:black"|
|
*350W Hg lamp
*350 W Hg lamp
*i-line filter (365nm bandpass filter)
*i-line filter (365nm band pass filter)
|style="background:WhiteSmoke; color:black"|
|
*500W Hg-Xe lamp
*500 W Hg-Xe lamp
*i-line filter (365nm bandpass filter)
*i-line filter (365nm band pass filter)
|style="background:WhiteSmoke; color:black"|
|
365nm LED
365 nm LED
|style="background:WhiteSmoke; color:black"|
|
375nm laser diode array
375 nm laser diode array
|style="background:WhiteSmoke; color:black"|
|
405nm laser diode array
405 nm laser diode array
|style="background:WhiteSmoke; color:black"|
|
*365nm LED
*365 nm LED
*405nm laser diode
*405 nm laser diode
 
|-
|-
|style="background:LightGrey; color:black"|Exposure mode
! scope=row| Exposure mode
|style="background:WhiteSmoke; color:black"|
|
*Flood exposure
*Flood exposure
*Proximity
*Proximity
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**Hard contact
**Hard contact
**Vacuum contact
**Vacuum contact
|style="background:WhiteSmoke; color:black"|
|
*Flood exposure
*Flood exposure
*Proximity
*Proximity
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**Hard contact
**Hard contact
**Vacuum contact
**Vacuum contact
|style="background:WhiteSmoke; color:black"|
|
*Projection:
*Projection:
**Pneumatic auto-focus
**Pneumatic auto-focus
|style="background:WhiteSmoke; color:black"|
|
*Projection:
*Projection:
**Optical auto-focus
**Optical auto-focus
**Pneumatic auto-focus
**Pneumatic auto-focus
|style="background:WhiteSmoke; color:black"|
|
*Projection:
*Projection:
**Pneumatic auto-focus
**Pneumatic auto-focus
|style="background:WhiteSmoke; color:black"|
|
*Projection:
*Projection:
**Optical auto-focus
**Optical auto-focus
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**Optical auto-focus
**Optical auto-focus
**Pneumatic auto-focus
**Pneumatic auto-focus
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Substrates
! scope=row| Batch size
|style="background:LightGrey; color:black"|Batch size
| 1 || 1 || 1 || 1 || 1 || 1
|style="background:WhiteSmoke; color:black"|
*1 100 mm wafer
|style="background:WhiteSmoke; color:black"|
*1 small sample, down to 10x10 mm<sup>2</sup>
*1 50 mm wafer
*1 100 mm wafer
*1 150 mm wafer
|style="background:WhiteSmoke; color:black"|
*1 small sample, down to 5x5 mm<sup>2</sup>
*1 50 mm wafer
*1 100 mm wafer
*1 150 mm wafer (exposure area only 125x125 mm<sup>2</sup>)
|style="background:WhiteSmoke; color:black"|
*1 small sample, down to 3x3 mm<sup>2</sup>
*1 50 mm wafer
*1 100 mm wafer
*1 150 mm wafer
*1 200 mm wafer
|style="background:WhiteSmoke; color:black"|
*1 small sample, down to 5x5 mm<sup>2</sup>
*1 50 mm wafer
*1 100 mm wafer
*1 150 mm wafer
|style="background:WhiteSmoke; color:black"|
*1 small sample, down to 3x3 mm<sup>2</sup>
*1 50 mm wafer
*1 100 mm wafer
*1 150 mm wafer
 
|-
|-
| style="background:LightGrey; color:black"|Allowed materials
! scope=row| Allowed materials
|style="background:WhiteSmoke; color:black"|
| All PolyFabLab materials
*All PolyFabLab materials
|
|style="background:WhiteSmoke; color:black"|
*All cleanroom materials except copper and steel
*All cleanroom materials except copper and steel
*Dedicated chuck for III-V materials
*Dedicated chuck for III-V materials
|style="background:WhiteSmoke; color:black"|
| All cleanroom materials
*All cleanroom materials
| All cleanroom materials
|style="background:WhiteSmoke; color:black"|
| All cleanroom materials
*All cleanroom materials
| All PolyFabLab materials
|style="background:WhiteSmoke; color:black"|
|-
*All cleanroom materials
|style="background:WhiteSmoke; color:black"|
*All PolyFabLab materials
|-  
|}
|}