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| {{cc-nanolab}} | | {{cc-nanolab}} |
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| '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/UVExposure click here]'''
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| [[Category: Equipment|Lithography exposure]] | | [[Category: Equipment|Lithography exposure]] |
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| =UV Exposure Comparison Table= | | =UV Exposure Comparison Table= |
| | | {| class="wikitable" |
| | | |- |
| {|border="1" cellspacing="1" cellpadding="10" style="text-align:left;" | | ! |
| | | ! [[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MA6-1|Aligner: MA6-1]] |
| !colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment | | ! [[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MA6-2|Aligner: MA6-2]] |
| |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MA6-1|Aligner: MA6-1]]</b>
| | ! [[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA1|Aligner: Maskless 01]] |
| |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MA6-2|Aligner: MA6-2]]</b>
| | ! [[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA2|Aligner: Maskless 02]] |
| |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA1|Aligner: Maskless 01]]</b>
| | ! [[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA3|Aligner: Maskless 03]] |
| |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA2|Aligner: Maskless 02]]</b>
| | ! [[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA4|Aligner: Maskless 04]] |
| |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA3|Aligner: Maskless 03]]</b>
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| |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA4|Aligner: Maskless 04]]</b>
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| |- | | |- |
| !style="background:silver; width:100px; color:black;" align="center"|Purpose | | ! scope=row| Purpose |
| |style="background:LightGrey; color:black"|
| | | |
| |style="background:WhiteSmoke; color:black"|
| | *Top side alignment |
| *Top Side Alignment | | *Back side alignment |
| *Back Side Alignment | |
| *UV exposure | | *UV exposure |
| OBS: this tool is in PolyFabLab
| | NB: this tool is in PolyFabLab |
| |style="background:WhiteSmoke; color:black"|
| | | |
| *Top Side Alignment | | *Top side alignment |
| *Back Side Alignment | | *Back side alignment |
| *UV exposure | | *UV exposure |
| *(DUV exposure)
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| *Bond alignment | | *Bond alignment |
| |style="background:WhiteSmoke; color:black"|
| | | |
| *Top Side Alignment | | *Top side alignment |
| *Maskless UV exposure | | *Maskless UV exposure |
| |style="background:WhiteSmoke; color:black"|
| | | |
| *Top Side Alignment | | *Top side alignment |
| *Back Side Alignment | | *Back side alignment |
| *Maskless UV exposure | | *Maskless UV exposure |
| |style="background:WhiteSmoke; color:black"|
| | | |
| *Top Side Alignment | | *Top side alignment |
| *Back Side Alignment | | *Back side alignment |
| *Maskless UV exposure | | *Maskless UV exposure |
| |style="background:WhiteSmoke; color:black"|
| | | |
| *Top Side Alignment | | *Top side alignment |
| *Maskless UV exposure | | *Maskless UV exposure |
| *Direct laser writing | | *Direct laser writing |
| OBS: this tool is in PolyFabLab
| | NB: this tool is in PolyFabLab |
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| |- | | |- |
| !style="background:silver; color:black" align="center" valign="center" rowspan="4"|Performance | | ! scope=row| Minimum feature size |
| |style="background:LightGrey; color:black"|Minimum feature size
| | | ~1 µm || ~1 µm || ~1 µm || ~1 µm || ~1 µm || ~1 µm |
| |style="background:WhiteSmoke; color:black"| | |
| ~1 µm | |
| |style="background:WhiteSmoke; color:black"| | |
| ~1 µm | |
| |style="background:WhiteSmoke; color:black"| | |
| ~1 µm | |
| |style="background:WhiteSmoke; color:black"| | |
| ~1 µm | |
| |style="background:WhiteSmoke; color:black"| | |
| ~1 µm | |
| |style="background:WhiteSmoke; color:black"| | |
| ~1 µm | |
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| |- | | |- |
| |style="background:LightGrey; color:black"|Alignment accuracy
| | ! scope=row| Alignment accuracy |
| |style="background:WhiteSmoke; color:black"|
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| *TSA: ±2 µm | | *TSA: ±2 µm |
| *BSA: ±5 µm | | *BSA: ±5 µm |
| |style="background:WhiteSmoke; color:black"|
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| *TSA: ±1 µm | | *TSA: ±1 µm |
| *BSA: ±2 µm | | *BSA: ±2 µm |
| |style="background:WhiteSmoke; color:black"|
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| ±2 µm<br>(±1 µm possible) | | ±2 µm<br>(±1 µm possible) |
| |style="background:WhiteSmoke; color:black"|
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| *TSA: ± 0.5 µm | | *TSA: ± 0.5 µm |
| *BSA: ± 1 µm | | *BSA: ± 1 µm |
| |style="background:WhiteSmoke; color:black"|
| | | |
| *TSA: ± 0.5 µm | | *TSA: ± 0.5 µm |
| *BSA: ± 1 µm | | *BSA: ± 1 µm |
| |style="background:WhiteSmoke; color:black"|
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| ±1 µm | | ±1 µm |
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| |- | | |- |
| |style="background:LightGrey; color:black"|Exposure light
| | ! scope=row| Exposure light source |
| |style="background:WhiteSmoke; color:black"|
| | | |
| *350W Hg lamp | | *350 W Hg lamp |
| *i-line filter (365nm bandpass filter) | | *i-line filter (365nm band pass filter) |
| |style="background:WhiteSmoke; color:black"|
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| *500W Hg-Xe lamp | | *500 W Hg-Xe lamp |
| *i-line filter (365nm bandpass filter) | | *i-line filter (365nm band pass filter) |
| |style="background:WhiteSmoke; color:black"|
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| 365nm LED
| | 365 nm LED |
| |style="background:WhiteSmoke; color:black"|
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| 375nm laser diode array
| | 375 nm laser diode array |
| |style="background:WhiteSmoke; color:black"|
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| 405nm laser diode array
| | 405 nm laser diode array |
| |style="background:WhiteSmoke; color:black"|
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| *365nm LED | | *365 nm LED |
| *405nm laser diode | | *405 nm laser diode |
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| |- | | |- |
| |style="background:LightGrey; color:black"|Exposure mode
| | ! scope=row| Exposure mode |
| |style="background:WhiteSmoke; color:black"|
| | | |
| *Flood exposure | | *Flood exposure |
| *Proximity | | *Proximity |
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| **Hard contact | | **Hard contact |
| **Vacuum contact | | **Vacuum contact |
| |style="background:WhiteSmoke; color:black"|
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| *Flood exposure | | *Flood exposure |
| *Proximity | | *Proximity |
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| **Hard contact | | **Hard contact |
| **Vacuum contact | | **Vacuum contact |
| |style="background:WhiteSmoke; color:black"|
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| *Projection: | | *Projection: |
| **Pneumatic auto-focus | | **Pneumatic auto-focus |
| |style="background:WhiteSmoke; color:black"|
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| *Projection: | | *Projection: |
| **Optical auto-focus | | **Optical auto-focus |
| **Pneumatic auto-focus | | **Pneumatic auto-focus |
| |style="background:WhiteSmoke; color:black"|
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| *Projection: | | *Projection: |
| **Pneumatic auto-focus | | **Pneumatic auto-focus |
| |style="background:WhiteSmoke; color:black"|
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| *Projection: | | *Projection: |
| **Optical auto-focus | | **Optical auto-focus |
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| **Optical auto-focus | | **Optical auto-focus |
| **Pneumatic auto-focus | | **Pneumatic auto-focus |
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| |- | | |- |
| !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Substrates | | ! scope=row| Batch size |
| |style="background:LightGrey; color:black"|Batch size
| | | 1 || 1 || 1 || 1 || 1 || 1 |
| |style="background:WhiteSmoke; color:black"| | |
| *1 100 mm wafer
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| |style="background:WhiteSmoke; color:black"| | |
| *1 small sample, down to 10x10 mm<sup>2</sup>
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| *1 50 mm wafer
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| *1 100 mm wafer
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| *1 150 mm wafer
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| |style="background:WhiteSmoke; color:black"| | |
| *1 small sample, down to 5x5 mm<sup>2</sup>
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| *1 50 mm wafer
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| *1 100 mm wafer
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| *1 150 mm wafer (exposure area only 125x125 mm<sup>2</sup>)
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| |style="background:WhiteSmoke; color:black"| | |
| *1 small sample, down to 3x3 mm<sup>2</sup>
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| *1 50 mm wafer
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| *1 100 mm wafer
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| *1 150 mm wafer
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| *1 200 mm wafer
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| |style="background:WhiteSmoke; color:black"| | |
| *1 small sample, down to 5x5 mm<sup>2</sup>
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| *1 50 mm wafer
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| *1 100 mm wafer
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| *1 150 mm wafer
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| |style="background:WhiteSmoke; color:black"| | |
| *1 small sample, down to 3x3 mm<sup>2</sup>
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| *1 50 mm wafer
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| *1 100 mm wafer
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| *1 150 mm wafer
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| |- | | |- |
| | style="background:LightGrey; color:black"|Allowed materials
| | ! scope=row| Allowed materials |
| |style="background:WhiteSmoke; color:black"| | | | All PolyFabLab materials |
| *All PolyFabLab materials
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| |style="background:WhiteSmoke; color:black"|
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| *All cleanroom materials except copper and steel | | *All cleanroom materials except copper and steel |
| *Dedicated chuck for III-V materials | | *Dedicated chuck for III-V materials |
| |style="background:WhiteSmoke; color:black"| | | | All cleanroom materials |
| *All cleanroom materials
| | | All cleanroom materials |
| |style="background:WhiteSmoke; color:black"| | | | All cleanroom materials |
| *All cleanroom materials
| | | All PolyFabLab materials |
| |style="background:WhiteSmoke; color:black"| | | |- |
| *All cleanroom materials
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| |style="background:WhiteSmoke; color:black"| | |
| *All PolyFabLab materials
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| |- | |
| |} | | |} |
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