Specific Process Knowledge/Etch/DRIE-Pegasus: Difference between revisions
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[[Image:DRIE-Pegasus.jpg |300x300px|thumb|The SPTS Pegasus in the Danchip cleanroom]] | [[Image:DRIE-Pegasus.jpg |300x300px|thumb|The SPTS Pegasus in the Danchip cleanroom]] | ||
= Important: New rules for using the Pegasus = | = Important: New rules (as of August 2011) for using the Pegasus = | ||
Until August 2011 processing at the Pegasus was complicated by frequent losses of wafers during transfer operations. It has now become clear that the instrument is much more susceptible to misalignments of the carousel than expected. A service engineer from SPTS has made a thorough realigning of the instrument that we hope will last a long time. We have therefore introduced a new set of rules that ''all users'' should be taught during a | Until August 2011 processing at the Pegasus was complicated by frequent losses of wafers during transfer operations. It has now become clear that the instrument is much more susceptible to misalignments of the carousel than expected. A service engineer from SPTS has made a thorough realigning of the instrument that we hope will last a long time. We have therefore introduced a new set of rules that ''all users'' should be taught during a new training session mandatory for all users regardless of prior experience. The rules are: | ||
and made it clear that the instrument is much | # and made it clear that the instrument is much | ||
# asdlfj | |||
= The DRIE Pegasus at Danchip = | = The DRIE Pegasus at Danchip = | ||