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Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions

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===Resist profile (linewidth and sidewall angle)===
===Resist profile (linewidth and sidewall angle)===
 
====Linewidth and sidewall angle vs exposure dose====
'''SEM images of 2µm triplets as a function of exposure dose:'''
'''SEM images of 2µm triplets as a function of exposure dose:'''
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====Linewidth and sidewall angle vs defocus parameter====
'''SEM images as a function of defocus parameter for Aligner: Maskless 02 (MLA2):'''
'''SEM images as a function of defocus parameter for Aligner: Maskless 02 (MLA2):'''
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|-style="background:WhiteSmoke; color:black"
|2µm triplets
|2µm triplets
|[[Image:W14 MA62 5214E vac D85_H6B_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F-8 D95_101.jpg|280px]]
|[[Image:W14 MA62 5214E vac D90_H4B_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F-1 D95_01.jpg|280px]]
|[[Image:W14 MA62 5214E vac D95_F3B_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F2 D95_01.jpg|280px]]
|[[Image:W14 MA62 5214E vac D100_B4T_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F5 D95_01.jpg|280px]]
|[[Image:W14 MA62 5214E vac D105_C6T_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F12 D95_101.jpg|280px]]


|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|Lines
|Lines
|[[Image:W14 MA62 5214E vac D85_H6B_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F-8 D95_102.jpg|280px]]
|[[Image:W14 MA62 5214E vac D90_H4B_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F-1 D95_02.jpg|280px]]
|[[Image:W14 MA62 5214E vac D95_F3B_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F2 D95_1_02.jpg|280px]]
|[[Image:W14 MA62 5214E vac D100_B4T_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F5 D95_02.jpg|280px]]
|[[Image:W14 MA62 5214E vac D105_C6T_01.jpg|280px]]
|[[Image:W33 MLA2 5214 F12 D95_102.jpg|280px]]


|}
|}




'''Result of image analysis of SEM images of 2µm triplets:'''
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! width="510" |  
! width="510" |  

Revision as of 15:03, 15 June 2026

The content on this page, including all images and pictures, was created by DTU Nanolab staff, unless otherwise stated.

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Mask Aligner vs Maskless Aligner

Slides presented at NNUM in Uppsala 2026: MA6 vs MLA 2026_v09

Mask design used in the investigation: LithoTestAlign_2025_v10.gds

Additional data

THIS PAGE IS UNDER CONSTRUCTION

AZ 5214E

Resolution

Exposure equipment Dose Contact/Defoc Resolution Comment
Aligner: MA6-2 100 Vacuum 1µm
Aligner: MA6-1 100 Vacuum 1.25µm Probably over-exposed
Aligner: Maskless 02 (MLA2) 90 2 1.25µm


SEM images from different exposure equipment:

2µm triplets Lines Trenches
Aligner: MA6-2

100mJ/cm2, vacuum contact

Aligner: MA6-1

100mJ/cm2, vacuum contact
(probably over-exposed)

Aligner: Maskless 02 (MLA2)

90mJ/cm2, defoc 2

SEM images of different size structures:

1µm triplets 2µm triplets 4µm triplets
Aligner: MA6-1

100mJ/cm2, vacuum contact
(probably over-exposed)


Yield

The yield is measured by inspecting all 116 lithographic resolution test structures in an optical microscope and recording the smallest resolved dots and lines.

Wafer maps at optimal processing conditions for different aligners
Aligner: Maskless 02 (MLA2) (Dose 90mJ/cm2; defoc 2).
Resolution: 1.22µm average; 0.1µm standard deviation.
Yield at 1.25µm: 99%		 Aligner: MA6-2 (Dose 100mJ/cm2; vacuum contact).
Resolution: 1.02µm average; 0.1µm standard deviation.
Yield at 1.25µm: 100%		 Aligner: MA6-1 (Dose 100mJ/cm2; vacuum contact). Probably over-exposed.
Resolution: 1.30µm average; 0.2µm standard deviation.
Yield at 1.25µm: 59%


Effect of exposure mode for mask aligner

Wafer maps at different exposure modes for Aligner: MA6-2 (Dose 100mJ/cm2)
Hard contact.
Resolution: 1.17µm average; 0.2µm standard deviation.
Yield at 1.25µm: 89%		 Soft contact.
Resolution: 3.77µm average; 0.7µm standard deviation.
Yield at 2.5µm: 4%		 10µm proximity.
Resolution: 4.19µm average; 0.7µm standard deviation.
Yield at 2.5µm: 3%


Wafer maps at different exposure modes for Aligner: MA6-1 (Dose 100mJ/cm2, probably over-exposed)
Hard contact.
Resolution: 1.58µm average; 0.5µm standard deviation.
Yield at 1.25µm: 48%		 Soft contact.
Resolution: 2.36µm average; 0.4µm standard deviation.
Yield at 2.5µm: 80%
At dose 92mJ/cm2, the average resolution decreases to 1.91µm and the yield at 2.5µm increases to 100%		 10µm proximity.
Resolution: 2.73µm average; 0.6µm standard deviation.
Yield at 2.5µm: 53%


Effect of WEC pressure for mask aligner (after WEC head service)

Wafer maps at different WEC pressure for Aligner: MA6-2 (Dose 100mJ/cm2)
Soft contact, 0.15bar WEC pressure.
Resolution: 3.92µm average; 0.9µm standard deviation.
Yield at 2.5µm: 8%		 Soft contact, 0.40bar WEC pressure.
Resolution: 2.19µm average; 0.5µm standard deviation.
Yield at 2.5µm: 86%
10µm proximity, 0.15bar WEC pressure.
Resolution: 3.22µm average; 0.8µm standard deviation.
Yield at 2.5µm: 34%		 10µm proximity, 0.40bar WEC pressure.
Resolution: 2.83µm average; 0.6µm standard deviation.
Yield at 2.5µm: 66%


Resist profile (linewidth and sidewall angle)

Linewidth and sidewall angle vs exposure dose

SEM images of 2µm triplets as a function of exposure dose:

85mJ/cm2 90mJ/cm2 95mJ/cm2 100mJ/cm2 105mJ/cm2
Aligner: MA6-2

Vacuum contact


80mJ/cm2 90mJ/cm2 100mJ/cm2 110mJ/cm2
Aligner: Maskless 02 (MLA2)

Defoc 2


Result of image analysis of SEM images of 2µm triplets:

Width of 2µm line and sidewall angle vs. exposure dose for 1.5µm AZ 5214E.
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).



Linewidth and sidewall angle vs defocus parameter

SEM images as a function of defocus parameter for Aligner: Maskless 02 (MLA2):

Defoc -8 Defoc -1 Defoc 2 Defoc 5 Defoc 12
2µm triplets
Lines


Result of image analysis of SEM images of 2µm triplets:

Linewidth and sidewall angle vs. defocus value for 1.5µm AZ 5214E exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm2.
Blue circles: Width of 2µm line.
Orange Squares: Sidewall angle.


AZ MiR 701

Resolution

  • Table with optimal parameters and resolution for different aligners
  • SEM pictures

Resist profile (sidewall angle and linewidth)

  • SEM pictures to support graphs?
Width of 2µm line vs. exposure dose for 1.5µm AZ MiR 701.
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).
Sidewall angle vs. exposure dose for 1.5µm AZ MiR 701.
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).
Linewidth and sidewall angle vs. defocus value for 1.5µm AZ MiR 701 exposed in Aligner: Maskless 02 (MLA2) using dose 275mJ/cm2.
Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.


AZ nLOF 2020

Resolution

  • Table with optimal parameters and resolution for different aligners
  • SEM pictures

Resist profile (sidewall angle and linewidth)

  • SEM pictures to support graphs?
Width of 2µm line vs. exposure dose for 2µm AZ nLOF 2020.
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 01 (MLA1) using defoc -4 (QC defoc=-2).
Grey triangles: Exposed on Aligner: Maskless 02 (MLA2) using defoc 0 (QC defoc=2).
Sidewall angle vs. exposure dose for 2µm AZ nLOF 2020.
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 01 (MLA1) using defoc -4 (QC defoc=-2).
Grey triangles: Exposed on Aligner: Maskless 02 (MLA2) using defoc 0 (QC defoc=2).
Linewidth and sidewall angle vs. defocus value for 2µm AZ nLOF exposed in Aligner: Maskless 01 (MLA1) using dose 220mJ/cm2.
Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.
Linewidth and sidewall angle vs. defocus value for 2µm AZ nLOF exposed in Aligner: Maskless 02 (MLA2) using dose 450mJ/cm2.
Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.


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