Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions
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* Table with optimal parameters and resolution for different aligners | * Table with optimal parameters and resolution for different aligners | ||
===Resist profile (sidewall angle and linewidth)=== | ===Resist profile (sidewall angle and linewidth)=== | ||
*SEM pictures to support graphs? | |||
[[Image:nLOF_Linewidth vs dose.jpg|left|500px|thumb|Width of 2µm line vs. exposure dose for 2µm AZ nLOF 2020. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 01 (MLA1) using defoc -4 (QC defoc=-2). <br>Grey triangles: Exposed on Aligner: Maskless 02 (MLA2) using defoc 0 (QC defoc=2).]] | [[Image:nLOF_Linewidth vs dose.jpg|left|500px|thumb|Width of 2µm line vs. exposure dose for 2µm AZ nLOF 2020. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 01 (MLA1) using defoc -4 (QC defoc=-2). <br>Grey triangles: Exposed on Aligner: Maskless 02 (MLA2) using defoc 0 (QC defoc=2).]] | ||