Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions
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==AZ 5214E== | ==AZ 5214E== | ||
===Resolution and yield=== | ===Resolution and yield=== | ||
* Aligner: Maskless 02 (MLA2) | * Table with optimal parameters and resolution for different aligners | ||
* Aligner: MA6-2 | * Wafer maps of: | ||
* Aligner: MA6- | ** Aligner: Maskless 02 (MLA2) | ||
** Aligner: MA6-1 | |||
** Aligner: MA6-2 before service | |||
** Aligner: MA6-2 after service + WEC pressure | |||
===Resist profile (sidewall angle and linewidth)=== | ===Resist profile (sidewall angle and linewidth)=== | ||