Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions
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[[Image:5214E_Sidewall vs dose.jpg|left|500px|thumb|Sidewall angle vs. exposure dose. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).]] | [[Image:5214E_Sidewall vs dose.jpg|left|500px|thumb|Sidewall angle vs. exposure dose. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).]] | ||
[[Image:5214E_Profile vs defoc.jpg|left|500px|thumb|Linewidth and sidewall angle vs. defocus value of patterns exposed in Aligner: Maskless 02 (MLA2) | [[Image:5214E_Profile vs defoc.jpg|left|500px|thumb|Linewidth and sidewall angle vs. defocus value of patterns exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.]] | ||
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Revision as of 15:56, 8 June 2026
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Slides presented at NNUM in Uppsala 2026
Additional data
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AZ 5214E
Resolution and yield
- Aligner: Maskless 02 (MLA2)
- Aligner: MA6-2
- Aligner: MA6-1
Resist profile (sidewall angle and linewidth)

Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).

Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).

Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.
AZ MiR 701
Resolution
Resist profile (sidewall angle and linewidth)
- Aligner: Maskless 02 (MLA2)
- Aligner: MA6-2
AZ nLOF 2020
Resolution
Resist profile (sidewall angle and linewidth)
- Aligner: Maskless 01 (MLA1)
- Aligner: Maskless 02 (MLA2)
- Aligner: MA6-2