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===Resist profile (sidewall angle and linewidth)===
===Resist profile (sidewall angle and linewidth)===
[[Image:5214E_Linewidth vs dose.jpg|left|600px|thumb|Width of 2µm line vs. exposure dose. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).]]
[[Image:5214E_Linewidth vs dose.jpg|left|500px|thumb|Width of 2µm line vs. exposure dose. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).]]


[[Image:5214E_Sidewall vs dose.jpg|left|600px|thumb|Sidewall angle vs. exposure dose. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).]]
[[Image:5214E_Sidewall vs dose.jpg|left|500px|thumb|Sidewall angle vs. exposure dose. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).]]
 
[[Image:5214E_Profile vs defoc.jpg|left|500px|thumb|Linewidth and sidewall angle vs. defocus value of patterns exposed in Aligner: Maskless 02 (MLA2) at 95mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. <br>Orange Squares: Sidewall angle.]]
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Revision as of 15:54, 8 June 2026

The content on this page, including all images and pictures, was created by DTU Nanolab staff, unless otherwise stated.

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Slides presented at NNUM in Uppsala 2026

MA6 vs MLA 2026_v09

Additional data

THIS PAGE IS UNDER CONSTRUCTION

AZ 5214E

Resolution and yield

  • Aligner: Maskless 02 (MLA2)
  • Aligner: MA6-2
  • Aligner: MA6-1

Resist profile (sidewall angle and linewidth)

Width of 2µm line vs. exposure dose.
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).
Sidewall angle vs. exposure dose.
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).
Linewidth and sidewall angle vs. defocus value of patterns exposed in Aligner: Maskless 02 (MLA2) at 95mJ/cm2.
Blue circles: Width of 2µm line.
Orange Squares: Sidewall angle.


AZ MiR 701

Resolution

Resist profile (sidewall angle and linewidth)

  • Aligner: Maskless 02 (MLA2)
  • Aligner: MA6-2

AZ nLOF 2020

Resolution

Resist profile (sidewall angle and linewidth)

  • Aligner: Maskless 01 (MLA1)
  • Aligner: Maskless 02 (MLA2)
  • Aligner: MA6-2
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