Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions
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===Resist profile (sidewall angle and linewidth)=== | ===Resist profile (sidewall angle and linewidth)=== | ||
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|+'''Lithographic result vs. exposure dose. Data by Thomas Anhøj @ DTU Nanolab, 2026.''' | |||
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|[[Image:5214E_Linewidth vs dose.jpg|450px]] | |||
|[[Image:5214E_Sidewall vs dose.jpg|450px]] | |||
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| Width of 2µm line vs. exposure dose. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2). || Sidewall angle vs. exposure dose. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2). | |||
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* Aligner: Maskless 02 (MLA2) | * Aligner: Maskless 02 (MLA2) | ||
* Aligner: MA6-2 | * Aligner: MA6-2 | ||