Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions
| Line 16: | Line 16: | ||
==AZ 5214E== | ==AZ 5214E== | ||
===Resolution | ===Resolution and yield=== | ||
* Aligner: Maskless 02 (MLA2) | * Aligner: Maskless 02 (MLA2) | ||
* Aligner: MA6-2 | * Aligner: MA6-2 | ||
* Aligner: MA6-1 | * Aligner: MA6-1 | ||
===Resist profile (sidewall angle and linewidth)=== | ===Resist profile (sidewall angle and linewidth)=== | ||
* Aligner: Maskless 02 (MLA2) | * Aligner: Maskless 02 (MLA2) | ||
Revision as of 13:04, 8 June 2026
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Slides presented at NNUM in Uppsala 2026
Additional data
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AZ 5214E
Resolution and yield
- Aligner: Maskless 02 (MLA2)
- Aligner: MA6-2
- Aligner: MA6-1
Resist profile (sidewall angle and linewidth)
- Aligner: Maskless 02 (MLA2)
- Aligner: MA6-2
- Aligner: MA6-1
AZ MiR 701
Resolution
Resist profile (sidewall angle and linewidth)
- Aligner: Maskless 02 (MLA2)
- Aligner: MA6-2
AZ nLOF 2020
Resolution
Resist profile (sidewall angle and linewidth)
- Aligner: Maskless 01 (MLA1)
- Aligner: Maskless 02 (MLA2)
- Aligner: MA6-2