Specific Process Knowledge/Lithography/Development/UV developer: Difference between revisions
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*AZ 726 MIF (TMAH): | *AZ 726 MIF (TMAH): 230 ml/min | ||
*Process DI water: 400 ml/min | *Process DI water: 400 ml/min (with BSR+CR) | ||
*Backside rinse DI water: | *Backside rinse DI water: 55 ml/min (with TSR+CR) | ||
*Process Nitrogen: 50 l/min | *Process Nitrogen: 50 l/min | ||
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