Specific Process Knowledge/Lithography/UVExposure/aligner MA6-1: Difference between revisions
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=Aligner: MA6-1= | |||
[[Image:KSAligner in E-4.jpg|400px|thumb|The Aligner: MA6-1 is located in PolyFabLab.]] | [[Image:KSAligner in E-4.jpg|400px|thumb|The Aligner: MA6-1 is located in PolyFabLab.]] | ||
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The user manual(s), quality control procedure(s) and results, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=44 LabManager] - '''requires login''' | The user manual(s), quality control procedure(s) and results, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=44 LabManager] - '''requires login''' | ||
==Exposure dose== | |||
[[Specific Process Knowledge/Lithography/Resist/UVresist/exposureDoseMaskAligners#Aligner:_MA6-1|Information on UV exposure dose]] | [[Specific Process Knowledge/Lithography/Resist/UVresist/exposureDoseMaskAligners#Aligner:_MA6-1|Information on UV exposure dose]] | ||
==Process information== | |||
The Aligner: MA6-1 has an i-line notch filter installed. This results in an exposure light peak around 365nm with a FWHM of 7nm. | The Aligner: MA6-1 has an i-line notch filter installed. This results in an exposure light peak around 365nm with a FWHM of 7nm. | ||
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==Quality Control (QC)== | |||
{| border="1" cellspacing="2" cellpadding="2" colspan="3" | {| border="1" cellspacing="2" cellpadding="2" colspan="3" | ||
|bgcolor="#98FB98" |'''Quality Control (QC) for KS Aligner''' | |bgcolor="#98FB98" |'''Quality Control (QC) for KS Aligner''' | ||
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==Equipment performance and process related parameters== | |||
{|border="1" cellspacing="1" cellpadding="10" style="text-align:left;" | {|border="1" cellspacing="1" cellpadding="10" style="text-align:left;" | ||