Specific Process Knowledge/Lithography/Development/UV developer: Difference between revisions
Created page with "==Developer TMAH UV-lithography== 400px|right|thumb|Developer: TMAH UV-lithography is located in E-4. Developer TMAH UV-lithography was released Q4 2014. Link to information about developer chuck size and hotplate pin positions. '''[https://www.youtube.com/watch?v=fs9DRH0Eo3k Training video]''' The user manual, user APV, and contact information can be found in [..." |
No edit summary |
||
| Line 1: | Line 1: | ||
=Developer TMAH UV-lithography= | |||
[[Image:SUSS DEV.JPG|400px|right|thumb|Developer: TMAH UV-lithography is located in E-4.]] | [[Image:SUSS DEV.JPG|400px|right|thumb|Developer: TMAH UV-lithography is located in E-4.]] | ||
| Line 17: | Line 17: | ||
*[[Specific Process Knowledge/Lithography/Development/Developer TMAH UV-lithography processing#Standard Processes|Standard processes]] | *[[Specific Process Knowledge/Lithography/Development/Developer TMAH UV-lithography processing#Standard Processes|Standard processes]] | ||
=Equipment performance and process related parameters= | |||
{|border="1" cellspacing="1" cellpadding="10" style="text-align:left;" | {|border="1" cellspacing="1" cellpadding="10" style="text-align:left;" | ||
