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Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,528 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,528 edits
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*BSA ±2µm
*BSA ±2µm
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~1 µm
±2µm<br>(±1µm possible)
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~1 µm
*TSA ±0.5µm
*BSA ±1µm
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~1 µm
*TSA ±0.5µm
*BSA ±1µm
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
~1 µm
±1µm
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