Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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|style="background:LightGrey; color:black"|Alignment modes | |style="background:LightGrey; color:black"|Alignment modes | ||
|style="background:WhiteSmoke; color:black" colspan="2"| | |style="background:WhiteSmoke; color:black" colspan="2"| | ||
*Top side (TSA) | *Top side (TSA), ±2µm (±1µm has been demonstrated) | ||
*Backside (BSA) | *Backside (BSA), ±5µm (±2µm has been demonstrated) | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | ||