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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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The samples used for these tests are 100mm Si wafers coated with a 1.5µm layer of the positive tone resist AZ 5214E. The deviations (±) given for the results here are calculated as half the range of measurements. If the range is small, the measurement uncertainty is used in stead.
The samples used for these tests are 100mm Si wafers coated with a 1.5µm layer of the positive tone resist AZ 5214E. The deviations (±) given for the results here are calculated as half the range of measurements. If the range is small, the measurement uncertainty is used in stead.


In the MLA1-MLA1 tests, the design consists of ±5µm verniers with 0.1µm resolution along the X and Y axis placed in a 3 by 3 matrix covering a 60mm by 60mm area centered on the wafer. The sample is loaded, and the first layer (the linear scales) is printed. Without unloading, the second layer (the vernier scales) is printed on top of the first, and then the sample is developed.
In the MLA1-MLA1 alignment tests, the design consists of ±5µm verniers with 0.1µm resolution along the X and Y axis placed in a 3 by 3 matrix covering a 60mm by 60mm area centered on the wafer. The sample is loaded, and the first layer with linear scales is printed (without global angle). Without unloading, the second layer with vernier scales is printed on top of the first, and then the sample is developed.


{|border="1" cellspacing="0" cellpadding="3" style="text-align:center;"  
{|border="1" cellspacing="0" cellpadding="3" style="text-align:center;"  
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!Scaling [ppm]
!Scaling [ppm]
!Shearing [mRad]
!Shearing [mRad]
!Error [µm]
!Average error [µm]
!Deviation [µm]
!Deviation [µm]
|-
|-
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| -
| -
|rowspan="2" align="center"| -
|rowspan="2" align="center"| -
| x error
| 0.03
| x deviation
| ±0.05


|-
|-
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|'''Y'''
|'''Y'''
| -
| -
| y error
| 0.10
| y deviation
| ±0.225


|-
|-
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| y error
| y error
| y deviation
| y deviation
|}
{|border="1" cellspacing="0" cellpadding="3" style="text-align:center;"
|-
|-
|-style="background:silver; color:black"
!colspan="2"|MLA3-MLA1
!Mark positions
!Scaling [ppm]
!Shearing [mRad]
!Average error [µm]
!Deviation [µm]
|-


|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|rowspan="2"|4 alignment marks
|rowspan="2"|description
(three samples)
(comment)
|'''X'''
|'''X'''
|NA
|rowspan="2" align="center"|positions
|rowspan="2"|NA
| x scaling
| -0.22±0.25
|rowspan="2" align="center"|shearing
| -0.19±0.19
| x error
| 1.85±2.08
| x deviation


|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|'''Y'''
|'''Y'''
| NA
| y scaling
| -0.28±0.38
| y error
| -0.28±0.13
| y deviation
| 4.35±5.97


|}
|}
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