Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
Appearance
| Line 393: | Line 393: | ||
*Minimum distance between TSA microscope objectives: 33 mm (8 mm for special objectives) | *Minimum distance between TSA microscope objectives: 33 mm (8 mm for special objectives) | ||
**Alignment of smaller separations is possible using the "scan microscope" function | |||
*Maximum distance between TSA microscope objectives: 160 mm | *Maximum distance between TSA microscope objectives: 160 mm | ||
*TSA microscope travel range: X +/- 25mm; Y +20mm / -75mm (towards flat) | *TSA microscope travel range: X +/- 25mm; Y +20mm / -75mm (towards flat) | ||
| Line 398: | Line 399: | ||
'''BackSide Alignment:''' | '''BackSide Alignment:''' | ||
*Minimum distance between BSA microscope objectives: 15 mm | *Minimum distance between BSA microscope objectives: 15 mm | ||
**Alignment of smaller separations is possible using the "scan microscope" function | |||
*Maximum distance between BSA microscope objectives: 100 mm | *Maximum distance between BSA microscope objectives: 100 mm | ||
*BSA microscope travel range: X +50mm / -16mm; Y +50mm / -20mm (towards flat) | *BSA microscope travel range: X +50mm / -16mm; Y +50mm / -20mm (towards flat) | ||