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Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

Jehem (talk | contribs)
Jehem (talk | contribs)
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*Minimum distance between TSA microscope objectives: 33 mm (8 mm for special objectives)
*Minimum distance between TSA microscope objectives: 33 mm (8 mm for special objectives)
**Alignment of smaller separations is possible using the "scan microscope" function
*Maximum distance between TSA microscope objectives: 160 mm
*Maximum distance between TSA microscope objectives: 160 mm
*TSA microscope travel range: X +/- 25mm; Y +20mm / -75mm (towards flat)
*TSA microscope travel range: X +/- 25mm; Y +20mm / -75mm (towards flat)
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'''BackSide Alignment:'''
'''BackSide Alignment:'''
*Minimum distance between BSA microscope objectives: 15 mm
*Minimum distance between BSA microscope objectives: 15 mm
**Alignment of smaller separations is possible using the "scan microscope" function
*Maximum distance between BSA microscope objectives: 100 mm
*Maximum distance between BSA microscope objectives: 100 mm
*BSA microscope travel range: X +50mm / -16mm; Y +50mm / -20mm (towards flat)
*BSA microscope travel range: X +50mm / -16mm; Y +50mm / -20mm (towards flat)