Specific Process Knowledge/Characterization/Optical characterization: Difference between revisions
Appearance
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!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment | !colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment | ||
|style="background:WhiteSmoke; color:black"|<b>Ellipsometer RC2</b> | |||
|style="background:WhiteSmoke; color:black"|<b>Ellipsometer VASE (M2000XI)</b> | |style="background:WhiteSmoke; color:black"|<b>Ellipsometer VASE (M2000XI)</b> | ||
|style="background:WhiteSmoke; color:black"|<b>Ellipsometer M-2000V</b> | |style="background:WhiteSmoke; color:black"|<b>Ellipsometer M-2000V</b> | ||
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!style="background:silver; color:black;" align="center" width="60"|Purpose | !style="background:silver; color:black;" align="center" width="60"|Purpose | ||
|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"| | ||
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*Measure thinfilm thicknesses and optical constants for single and multilayer optical transparent thinfilms. | |||
*Measure opticals constants for bulk material. | |||
*Measure thinfilm thicknesses and optical constants at elevated temperature <300C | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Measure thinfilm thicknesses and optical constants for single and multilayer optical transparent thinfilms. | *Measure thinfilm thicknesses and optical constants for single and multilayer optical transparent thinfilms. | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Performance | !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Performance | ||
|style="background:LightGrey; color:black"|Films that can be examined | |style="background:LightGrey; color:black"|Films that can be examined | ||
|style="background:WhiteSmoke; color:black"| | |||
Any film that is transparent to the light in the given wavelength range | |||
e.g.: | |||
*Silicon Oxide | |||
*Silicon nitride | |||
*PolySilicon | |||
*Resists | |||
*Polymers | |||
*Very thin layers of metals | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
Any film that is transparent to the light in the given wavelength range | Any film that is transparent to the light in the given wavelength range | ||
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|style="background:LightGrey; color:black"|Film thickness range | |style="background:LightGrey; color:black"|Film thickness range | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*~20Å to | *~20Å to a few micrometers (depending of the material) | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*~20Å to | *~20Å to a few micrometers (depending of the material) | ||
|style="background:WhiteSmoke; color:black"| | |||
*~20Å to a few micrometer (depending of the material) | |||
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!style="background:silver; color:black" align="center" valign="center" rowspan="4"|Process parameter range | !style="background:silver; color:black" align="center" valign="center" rowspan="4"|Process parameter range | ||
|style="background:LightGrey; color:black"|Wavelength range | |style="background:LightGrey; color:black"|Wavelength range | ||
|style="background:WhiteSmoke; color:black"| | |||
*210nm-1690nm | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*210nm-1690nm | *210nm-1690nm | ||
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|style="background:LightGrey; color:black"|Incident angle range | |style="background:LightGrey; color:black"|Incident angle range | ||
|style="background:WhiteSmoke; color:black"| | |||
*45-90 degrees | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*45-90 degrees | *45-90 degrees | ||
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|style="background:LightGrey; color:black"|Beam size | |style="background:LightGrey; color:black"|Beam size | ||
|style="background:WhiteSmoke; color:black"| | |||
*3mm (spot size on sample depends on the angle) | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*2mm (spot size on sample depends on the angle) | *2mm (spot size on sample depends on the angle) | ||
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|style="background:LightGrey; color:black"|Mapping facility | |style="background:LightGrey; color:black"|Mapping facility | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Can make | *Can make wafer maps on up to 150mm wafers | ||
|style="background:WhiteSmoke; color:black"| | |||
*Can make wafer maps on up to 150mm wafers | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*No mapping facility | *No mapping facility | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Accessories | !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Accessories | ||
|style="background:LightGrey; color:black"|Focusing optics | |style="background:LightGrey; color:black"|Focusing optics | ||
|style="background:WhiteSmoke; color:black"| | |||
*Focus lenses can be applied, reduces the beam diameter to 120µm | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Focus lenses can be applied, reduces the beam diameter to 125µm | *Focus lenses can be applied, reduces the beam diameter to 125µm | ||
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*Extra stage for transmission measurements | *Extra stage for transmission measurements | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Base for ex-situ measurements, transmission data can be done by holding the sample up | *Extra stage for transmission measurements | ||
|style="background:WhiteSmoke; color:black"| | |||
*Base for ex-situ measurements, transmission data can be done by holding the sample up against the detector | |||
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!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Substrates | !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Substrates | ||
|style="background:LightGrey; color:black"|Batch size | |style="background:LightGrey; color:black"|Batch size | ||
|style="background:WhiteSmoke; color:black"| | |||
*One sample at a time smaller than 150mm (ask if you have anything larger) | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*One sample at a time smaller than 150mm (ask if you have anything larger) | *One sample at a time smaller than 150mm (ask if you have anything larger) | ||
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*Any material that does not leave residuals on the stage and that does not evaporate | *Any material that does not leave residuals on the stage and that does not evaporate | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Any material that may go into the | *Any material that does not leave residuals on the stage and that does not evaporate | ||
|style="background:WhiteSmoke; color:black"| | |||
*Any material that may go into the ALD2 (when mounted on that system) | |||
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