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Specific Process Knowledge/Thin film deposition/Furnace LPCVD TEOS: Difference between revisions

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NLAB-Employees-701, NLAB-LabmanagerAllUsers, Administrators
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{| border="2" cellspacing="0" cellpadding="10"   
{| border="2" cellspacing="0" cellpadding="10"   
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!colspan="2" border="none" style="background:silver; color:black;" align="center"|Purpose  
!colspan="2" border="none" style="background:silver; color:black" align="center"|Purpose  
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|'''Deposition of TEOS oxide'''
|style="background:WhiteSmoke; color:black"|
Deposition of TEOS oxide
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Performance
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Performance
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