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| https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Sensofar_S_Neox | | https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Sensofar_S_Neox |
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| ==Optical Profiler (Filmetrics)==
| | info moved to |
| {{CC-bghe2}} <br>
| | https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Filmetrics |
| [[image:Scanner without anotation.jpg|275x275px|right|thumb|Optical Profiler (Filmetrics): positioned in the basement (346-904), {{photo1}}]]
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| The Profilm3D optical profiler from Filmetrics uses white-light-interferometry (WLI) and phase-shifting-interferometry (PSI) to produce surface profiles and depth-of-field color images.
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| The main purpose is 3D topographic imaging of surfaces, step height measurements and roughness measurements with larger FOV (Field Of View) than the AFM, but less horisontal resolution.
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| For most samples the optical profiler provides fast and easy information without any sample preparation. However, it can be necessary to cover thin transparent layers (< 2 µm) with a thin layer of metal.
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| The resolution is limited by the objective and the sampling resolution.
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| '''The user manual, technical information and contact information can be found in LabManager (requires login):'''
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| [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=467 Optical profiler (Filmetrics) info page in LabManager]
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| ===Equipment performance and process related parameters===
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| {| border="2" cellspacing="0" cellpadding="10"
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| !colspan="2" border="none" style="background:silver; color:black;" align="center"|<b>Equipment</b>
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| |style="background:WhiteSmoke; color:black"|<b>Optical profiler</b>
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| |-
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| !style="background:silver; color:black;" align="left"|Purpose
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| |style="background:LightGrey; color:black"|3D topographic imaging of surfaces.||style="background:WhiteSmoke; color:black"|
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| *3D imaging of surfaces
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| *Roughness measurements
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| *Step height measurements
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| *3D topographic measurements
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| |-
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| !style="background:silver; color:black;" align="left"|Posibilities
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| |style="background:LightGrey; color:black"|Interferometric profiling||style="background:WhiteSmoke; color:black"|
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| *Standard microscope imaging
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| *PSI (Phase Shift Interferometry)
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| *WLI (White light Interferometry)
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| *Stitched scans
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| *Wafer mapping
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| |-
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| !style="background:silver; color:black" align="left"|Performance
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| |style="background:LightGrey; color:black"|With the current 10x objective||style="background:WhiteSmoke; color:black"|
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| [https://labmanager.dtu.dk/view_binary.php?fileId=4174 See here the data sheet for this instrument (requires login)]]
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| !style="background:silver; color:black" align="left"|Substrates
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| |style="background:LightGrey; color:black"|Substrate size
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| |style="background:WhiteSmoke; color:black"|
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| *Substrates no bigger than 100 mm x 100mm
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| |-
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| |style="background:silver; color:black"|
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| | style="background:LightGrey; color:black"|Substrate materials allowed
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| |style="background:WhiteSmoke; color:black"|
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| *In principle all materials
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| |-
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| |}
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| == Dektak 3ST == | | == Dektak 3ST == |
