The P17 Stylus Profiler from KLA Tencor is used in a similar manner to the Dektak XTA for profiling surfaces with structures in the micro- and submicrometer range as well as for measuring [[Specific_Process_Knowledge/Characterization/Stress_measurement|stress]].
Compared to the DektakXT, the P17 has more advanced options for stress measurements: It allows the user to measure a stress map with up to 5° radial resolution. Programming and analyzing a sequence of predefined scans in fixed locations on a wafer is also easier and the manual for doing it much better for the P17 than for the DektakXT. A disadvantage of the P17 is that is can be hard to locate structures as the maximum field of view of the camera is 1x1.5 mm. We recommend having a map of the sample design available so you can easily locate the features of interest. Otherwise the P17 is easy to use, fast, and accurate, just like the DektakXT.
'''The user manual, quality control procedure and results, technical information and contact information can be found in LabManager:'''
[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=486 P17 page in LabManager]
===Process information ===
*Info about [[/Stylus profiler measurement uncertainty|measurement accuracy]].
*Using the analysis software: [[Specific_Process_Knowledge/Characterization/Profiler/Apex software|Apex software access & tips]]
*Info about making [https://labmanager.dtu.dk/view_binary.php?fileId=4699 2D stress measurements] ''(requires login)''. Most users will want to make 3D stress measurements, which is described in the regular Nanolab manual for the P17, also found on LabManager. It counts as "3D" if you wish to make 2 perpendicular scans. A "2D" stress scan means a single line scan per wafer - the software does not even allow manual rotation of the stage for this type of scan.
'''Acceptance test'''
*The acceptance test carried out for the P17: [[:File:Acceptance test p17 final_no-names.pdf]]
*Vendor's own [https://labmanager.dtu.dk/view_binary.php?fileId=5545 conformity test results] after installation ''(requires login)''.
===Equipment performance and process related parameters===
[[image:KLA-Tencor P17 profiler.jpg|275x275px|right|thumb|Front of the P17 profiler located in cleanroom F-2.]]
|style="background:LightGrey; color:black"|Scan range X Y
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Line scan X: 20 µm to 200 mm in a single scan. No stitching.
Map scan XY: In principle any rectangle that can be inscribed in a 200 mm circle, but resolution is limited to max. 4 million points and scanning is slow. In practice to get good resolution scan a very small area (e.g., 100 x 500 µm)
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|style="background:LightGrey; color:black"|Scan range Z
|style="background:WhiteSmoke; color:black"|
50 nm to 900 µm. It is possible to measure smaller steps but not recommended as the results may not be accurate.
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|style="background:LightGrey; color:black"|Resolution X Y
|style="background:WhiteSmoke; color:black"|
Down to 0.025 µm in theory, but the tip radius is 2 µm, so the meaningful resolution is at the same order of magnitude
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|style="background:LightGrey; color:black"|Resolution Z
|style="background:WhiteSmoke; color:black"|
0.01 Å, 0.08 Å, or 0.6 Å according to the manufacturer for ranges 13 µm, 131 µm, and 1 mm. Note the smallest of these values are purely theoretical as they are far below the lab's noise level.
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|style="background:LightGrey; color:black"|Height accuracy z (95 % confidence)
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~ 2 % for the smallest range for a 1 micron step and ~ 1 % for a 25 micron step '''for well-defined steps that are easy to measure''' (read about reducing and estimating the measurement uncertainty [[/Stylus profiler measurement uncertainty|here]])
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|style="background:LightGrey; color:black"|Max scan depth as a function of trench width W
Unless otherwise stated, all content in this section was done by Berit Herstrøm, DTU Nanolab
Optical Profiler (Sensofar): positioned in the clean room C-1), Photo: DTU Nanolab internal
The Sensofar S Neox 3D Optical Profiler has a sensor head that combines confocal, interferometry and focus variation techniques as well as thick and thin film measurement capabilities.
The Neox sensor head provides standard microscope imaging, confocal imaging, confocal profiling, PSI (Phase Shift Interferometry), CSI (Coherence Scanning Interferometry), Active illumination (Ai) Focus Variation and high resolution thin film thickness measurements on a single instrument.
The main purpose is 3D topographic imaging of surfaces, step height measurements in smaller trenches/holes than can be obtained with standard stylus methods (i.e. with aspect ratios higher that 1:1), roughness measurements with larger FOV (Field Of View) than the AFM, but less horisontal resolution.
For most samples the optical profiler provides fast and easy information without any sample preparation. However, it can be necessary to cover thin transparent layers (< 2 µm) with a thin layer of metal.
The resolution is limited by the objectives and the pixel resolution.
From the Sensofar Metrology, used with permission
Analysis software:
Free analysis software for visualizing and analyzing AFM and Optical profiler files (Sensofar) Gwyddion
SensoView software from Sensfar want also be downloaded for all users: U:\Nlab\CleanroomDrive\_Equipment\Optical profiler Sensofar\SensoVIEW 1.6.0
We have an extra license to the more advanced SensoMap software. As a user of the system you can access this by remote desktop here: DTU-8CC0321MFL. You log in using your DTU login.
The user manual, technical information (SensoSCAN and SensoVIEW manuals) and contact information can be found in LabManager (requires login):
Equipment performance and process related parameters
Equipment
Optical profiler
Purpose
3D topographic imaging of surfaces.
3D imaging of surfaces
Roughness measurements
Step height measurements
3D topographic measurements
Thick and thin film thickness measurements in small spots
Posibilities
Confocal, interferometric and AI focus variation tophography and reflectometry
Standard microscope imaging
Confocal imaging
Confocal profiling
PSI (Phase Shift Interferometry)
CSI (Coherence Scanning Interferometry)
Active illumination (Ai) Focus Variation
High resolution thin film thickness measurement using reflectrometry
Stitched scans
Wafer mapping
From the Sensofar S Neox 3D optical profiler brochure, used with permission
Performance
Depending on the objective chosen
See the performance of the different objectives here:
Substrates
Substrate size
Substrates no bigger than 150 mm x 150mm
Substrate materials allowed
In principle all materials as long as they are allowed in the cleanroom outside fumehoods - no liquids!
Optical Profiler (Filmetrics)
Unless otherwise stated, all content in this section was done by Berit Herstrøm, DTU Nanolab
Optical Profiler (Filmetrics): positioned in the basement (346-904), Photo: DTU Nanolab internal
The Profilm3D optical profiler from Filmetrics uses white-light-interferometry (WLI) and phase-shifting-interferometry (PSI) to produce surface profiles and depth-of-field color images.
The main purpose is 3D topographic imaging of surfaces, step height measurements and roughness measurements with larger FOV (Field Of View) than the AFM, but less horisontal resolution.
For most samples the optical profiler provides fast and easy information without any sample preparation. However, it can be necessary to cover thin transparent layers (< 2 µm) with a thin layer of metal.
The resolution is limited by the objective and the sampling resolution.
The user manual, technical information and contact information can be found in LabManager (requires login):
The computer connected to the Dektak 3ST is pretty old and runs Windows 98 SE. It is not connected to the network but traces can be saved on either USB memory stick or floppy disk. The USB driver is an old universal driver and has been shown to work with small size USB sticks. However it did not work with an 8GB Kingston stick.
Equipment performance and process related parameters
Performance
Vertical Range
65 kÅ, 655 kÅ, 1310 kÅ
Scan length range
50-50000 µm
Stylus track force
Recommended: 3-10 mg, depending on the softness of the surface
Scan speed ranges
High speed: 3s for 50µm to 50000µm
Medium speed: 12s for 50µm to 10000µm
Low speed: 50s
Materials
Allowed substrate materials
III-V
Silicon
polymer
Stylus Profiler: Dektak150
Stylus profiler:Dektak150, currently located in building 451, room 913 (as of 2023).
The stylus profiler Dektak150 is intended for profile measurements on samples outside the cleanroom. The Dektak150 is especially well suited for measuring soft samples as it can be adjusted to apply lower force than the other stylus profilers at Nanolab.
The user manual, technical information and contact information can be found in LabManager:
