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The sections below describe each profiler (stylus profilers and optical profilers) in more detail.
The sections below describe each profiler (stylus profilers and optical profilers) in more detail.


==Dektak XTA stylus profiler==
info copied to  
 
https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Dektak_XTA#Performance_and_Process_Parameters
The Dektak XTA stylus profiler from Brüker is used for profiling surfaces of samples with structures in the micro- and nanometer range. The size of the structures that can be measured is limited by the tip dimensions.
 
A profile measurement can be done across a specific structure by using a high magnification camera to locate the structure. It is also possible to program the stylus to measure in several positions, defined with respect to some deskew points. [[Specific_Process_Knowledge/Characterization/Stress_measurement|Stress measurements]] of thin films can be done by measuring the wafer bow. However, for predefined measurement programs or stress measurements, we recommend the P17 profiler - see next section.
 
 
'''The user manual, quality control procedure and results, technical information and contact information can be found in LabManager:'''
 
[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=304 Dektak XTA in LabManager]
 
Info about measurement accuracy can be found [[/Stylus profiler measurement uncertainty|here]].
 
===Equipment performance and process related parameters===
 
[[image:Dektak XTA new.JPG|275x275px|right|thumb|Dektak XTA. Now in cleanroom C-1, at time of photo it was somewhere else.]]
 
{| border="2" cellspacing="0" cellpadding="10"
|-
!style="background:silver; color:black;" align="left"|Purpose
|style="background:LightGrey; color:black"|Profiler for measuring micro structures||style="background:WhiteSmoke; color:black"|
*Single line profiles
*Wafer mapping
*[[Specific_Process_Knowledge/Characterization/Stress_measurement|Stress measurements]] by measuring wafer bow
*Surface roughness on a line scan
|-
!style="background:silver; color:black" align="left" rowspan="6" valign="top" |Performance
|style="background:LightGrey; color:black"|Scan range x y
|style="background:WhiteSmoke; color:black"|
Line scan x: 50 µm to 55 mm in a single scan, up to 200 mm with stiching
|-
|style="background:LightGrey; color:black"|Scan range z
|style="background:WhiteSmoke; color:black"|
50 Å to 1 mm
|-
|style="background:LightGrey; color:black"|Resolution x y
|style="background:WhiteSmoke; color:black"|
Down to 0.003 µm theoretically, in practice limited by the tip radius
|-
|style="background:LightGrey; color:black"|Resolution z
|style="background:WhiteSmoke; color:black"|
1 Å, 10 Å, 80 Å or 160 Å (for ranges 65 kÅ, 655 kÅ, 5240 kÅ and 1 mm respectively)
|-
|style="background:LightGrey; color:black"|Height accuracy z (95 % confidence)
|style="background:WhiteSmoke; color:black"|
~ 2 % for a 1 µm step with the smallest measurement range and ~ 1 % for a 25 µm step ''for well-defined steps that are easy to measure'' (read about reducing and estimating the measurement uncertainty [[/Stylus profiler measurement uncertainty|here]])
|-
|style="background:LightGrey; color:black"|Max scan depth as a function of trench width W
|style="background:WhiteSmoke; color:black"|
1.2*(W[µm]-5µm)
 
|-
!style="background:silver; color:black" align="left"|Hardware settings
|style="background:LightGrey; color:black"|Tip radius
|style="background:WhiteSmoke; color:black"|
*5 µm 45<sup>o</sup> cone
|-
!style="background:silver; color:black" align="left" rowspan="5" valign="top" |Substrates
|style="background:LightGrey; color:black"|Substrate size
|style="background:WhiteSmoke; color:black"|
*Up to 6"
|-
| style="background:LightGrey; color:black"|Substrate materials allowed
|style="background:WhiteSmoke; color:black"|
*All materials that do not stick to the tip or leave residues on the chuck
*For very soft polymers we recommend the Dektak 150, see below
|-
|}


==Stylus Profiler (Tencor P17) ==
==Stylus Profiler (Tencor P17) ==