Specific Process Knowledge/Pattern Design: Difference between revisions
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At Nanolab we offer all users '''free access to CleWin 6''' for their mask layout. You can find more information on how to Install [[Specific Process Knowledge/Pattern Design/CleWin|CleWin 6]] on your local computer [[Specific Process Knowledge/Pattern Design/CleWin|here]]. | At Nanolab we offer all users '''free access to CleWin 6''' for their mask layout. You can find more information on how to Install [[Specific Process Knowledge/Pattern Design/CleWin|CleWin 6]] on your local computer [[Specific Process Knowledge/Pattern Design/CleWin|'''here''']]. | ||
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=== Layout file format=== | === Layout file format=== | ||
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* For '''DUV-lithography''' and DUV-lithography it is necessary to have physical masks (reticles) produced based on the layout file. The file format has to be GDS. For more details concerning the design of reticles see [[Specific_Process_Knowledge/Lithography/DUVStepperLithography#Process_information|Design of Reticles]]. | * For '''DUV-lithography''' and DUV-lithography it is necessary to have physical masks (reticles) produced based on the layout file. The file format has to be GDS. For more details concerning the design of reticles see [[Specific_Process_Knowledge/Lithography/DUVStepperLithography#Process_information|Design of Reticles]]. | ||
== Mask Design for UV-lithography == | == Mask Design for UV-lithography == | ||