Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

@@ Line 594: / Line 594: @@
 !Aligner: Maskless 01 (MLA1)
 |-
-|Nominal intensity
+|Topside alignment error
-|11 mW/cm<sup>2</sup> @ 365 nm
+|>1µm
 |-
-|Intensity deviation from nominal
+|Topside alignment error
-|≤5%
+|>1µm
-|-
-|Intensity non-uniformity
-|≤2%
 |-
 |}
 |-
 |}
-Power supply and/or lamp will be adjusted if intensity is outside the limit.
+Camera offsets will be adjusted if alignment error is outside the limit.
 |}