Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300: Difference between revisions
Tag: Manual revert |
mNo edit summary |
||
| Line 45: | Line 45: | ||
*[[/Crystal Settings|Crystal Thickness Monitor Settings]] | *[[/Crystal Settings|Crystal Thickness Monitor Settings]] | ||
*Results from the acceptance test: | *Results from the acceptance test: | ||
**[[/IBSD of TiO2|Deposition of TiO2]] | **[[Specific Process Knowledge/Thin film deposition/Deposition of Titanium Oxide/IBSD of TiO2|Deposition of TiO2]] | ||
**[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/IBSD of SiO2|Deposition of SiO2]] | **[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/IBSD of SiO2|Deposition of SiO2]] | ||
**[[/IBSD of Si|Deposition of Si]] | **[[/IBSD of Si|Deposition of Si]] | ||