Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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Link to information about [[Specific_Process_Knowledge/Pattern_Design#Alignment_marks|alignment mark design and locations]]. | Link to information about [[Specific_Process_Knowledge/Pattern_Design#Alignment_marks|alignment mark design and locations]]. | ||
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===Quality Control (QC)=== | ===Quality Control (QC)=== | ||
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Power supply and/or lamp will be adjusted if intensity is outside the limit. | Power supply and/or lamp will be adjusted if intensity is outside the limit. | ||
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===Equipment performance and process related parameters=== | ===Equipment performance and process related parameters=== | ||