Specific Process Knowledge/Lithography/nLOF: Difference between revisions

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	Cross-linking negative resists have the potential to be developed using organic solvents instead of the normally used alkaline aqueous solutions. A quick test of this was carried out by Thomas Anhøj @ DTU Nanolab, showing that nLOF 2020 could potentially be used for water-free lithography.		Cross-linking negative resists have the potential to be developed using organic solvents instead of the normally used alkaline aqueous solutions. A quick test of this was carried out by Thomas Anhøj @ DTU Nanolab, showing that nLOF 2020 could potentially be used for water-free lithography.

	A small report on the ~~tests~~ can be found here: [[media:nLOF_solventdev_2024.pdf\|'''nLOF solvent development 2024''']].		A small report on the test can be found here: [[media:nLOF_solventdev_2024.pdf\|'''nLOF solvent development 2024''']].