Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 04 processing: Difference between revisions
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The alignment accuracy of the Aligner: Maskless 01 is a combination of the position accuracy of the stage, the accuracy of the alignment mark detection, and the distortion of the pattern already on the wafer (first print). The alignment specification of the machine is 1µm for both raster and vector mode, which was demonstrated in the factory acceptance test and the site acceptance test after installation. | The alignment accuracy of the Aligner: Maskless 01 is a combination of the position accuracy of the stage, the accuracy of the alignment mark detection, and the distortion of the pattern already on the wafer (first print). The alignment specification of the machine is 1µm for both raster and vector mode, which was demonstrated in the factory acceptance test and the site acceptance test after installation. | ||
<br>An alignment test performed shortly after installation, using a 3x3 array of structures with 30mm pitch, showed an alignment error of 0.29±0.18µm in X and -0.49±0.23µm in Y. | |||