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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 04 processing: Difference between revisions

Taran (talk | contribs)
Taran (talk | contribs)
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'''Raster mode'''  
'''Raster mode'''  
{|border="1" cellspacing="1" cellpadding="10" style="text-align:left;"
|-
|-
|-style="background:silver; color:black"
|
!Date
!Thickness
!Exposure mode
!Dose
!Defoc
!Resolution
!Comments
|-
|-
|-style="background:WhiteSmoke; color:black"
!AZ 1500
| 2024-12-17<br>FAT/SAT
| 0.5 µm
| Raster
| 80 mJ/cm<sup>2</sup>
| 10 (optical)
| 1 µm
| 4" mask plate with Cr<br>Development: 60s in 1:4 AZ 351B
|-
|-
|-style="background:WhiteSmoke; color:black"
!AZ 5214E
| 2024-12-18<br>during installation
| 1.5 µm
| Raster
| 85 mJ/cm<sup>2</sup>
| 15 (optical)
| >1 µm
| 4" Si wafer<br>Development: 60s in 1:4 AZ 351B
|-
|-
|-style="background:whitesmoke; color:black"
!SU8 2035
| 2025-??-??</span><br>elkh?
| 15 µm
| Raster
| ? mJ/cm<sup>2</sup>
| ? (?)
| ? µm
| 4" Si wafer<br>Development:
|-
|}
<br>


'''Vector mode'''
'''Vector mode'''
{|border="1" cellspacing="1" cellpadding="10" style="text-align:left;"
|-
|-
|-style="background:silver; color:black"
|
!Date
!Thickness
!Exposure mode
!Dose
!Defoc
!Resolution
!Comments
|-
|-
|-style="background:WhiteSmoke; color:black"
!AZ 1500
| 2024-12-17<br>FAT/SAT
| 0.5 µm
| Vector
|
Pen: 1µm<br>
Transmission: 100%<br>
Laser Power: 120 mW<br>
Velocity: 17 mm/s<br>
| 30 (optical)
| 1 µm
| 4" mask plate with Cr<br>Development: 60s in 1:4 AZ 351B
|-
|-
|-style="background:WhiteSmoke; color:black"
!AZ 5214E
| 2025-??-??<br>taran?
| 1.5 µm
| Vector
|
Pen: 1µm<br>
Transmission: 100%<br>
Laser Power: 120? mW<br>
Velocity: ?? mm/s<br>
| 30? (optical)
| ? µm
| 4" Si wafer<br>Development: 60s in 1:4 AZ 351B
|-
|}
<br>


==Writing speed==
==Writing speed==