Specific Process Knowledge/Etch/ICP Metal Etcher/Chromium/End point: Difference between revisions
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=== End point signal=== | |||
====Barc etch==== | |||
The End point signal shows a top point after 5.5 s and I stopped the etch after 46.4 s giving ''' 41 s after the top point'''. | |||
<gallery caption="S047676 47s barc etch, Feb-2025, wafer center, 100 nm Cr mask, with 500 nm resist" widths="600px" heights="550px" perrow="2"> | |||
File:data 03 screen shot 01.jpg | |||
File:data 03 screen shot 02.jpg | |||
</gallery> | |||
====Cr etch==== | |||
The End point signal shows a drop after 295 s and I stopped the etch after 465 s giving '''170 s after the drop started'''. | |||
<gallery caption="S047676 7:43 min Cr etch, Feb-2025, wafer center, 100 nm Cr mask, with 500 nm resist" widths="600px" heights="550px" perrow="2"> | |||
File:data 05 screen shot 02.jpg | |||
File:data 05 screen shot 04.jpg | |||
</gallery> | |||