Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142: Difference between revisions
| Line 44: | Line 44: | ||
C4F8 75 sccm, SF6 38 sccm, 4 mTorr, Strike 3 secs @ 15 mTorr, 800 W CP, 40 W PP, -20 degs, 120 secs | C4F8 75 sccm, SF6 38 sccm, 4 mTorr, Strike 3 secs @ 15 mTorr, 800 W CP, 40 W PP, -20 degs, 120 secs | ||
</gallery> | </gallery> | ||
{| {{table}} | |||
| align="center" style="background:#f0f0f0;"|'''Nominal trench line width''' | |||
| align="center" style="background:#f0f0f0;"|'''''' | |||
| align="center" style="background:#f0f0f0;"|'''30''' | |||
| align="center" style="background:#f0f0f0;"|'''60''' | |||
| align="center" style="background:#f0f0f0;"|'''90''' | |||
| align="center" style="background:#f0f0f0;"|'''120''' | |||
| align="center" style="background:#f0f0f0;"|'''150''' | |||
| align="center" style="background:#f0f0f0;"|'''Average''' | |||
| align="center" style="background:#f0f0f0;"|'''Std. dev.''' | |||
|- | |||
| Etch rates||nm/min||148||158||164||167||166||160||8 | |||
|- | |||
| Sidewall angle||degs||90||90||90||90||90||90||0 | |||
|- | |||
| CD loss||nm/edge||7||-7||-7||-28||-28||-13||15 | |||
|- | |||
| CD loss foot||nm/edge||12||5||6||-15||-1||1||10 | |||
|- | |||
| Bowing||||-1||1||-2||-5||-7||-3||3 | |||
|- | |||
| Bottom curvature||||-46||-30||-29||-31||-27||-32||8 | |||
|- | |||
| zep||nm/min||||||||||||65|| | |||
|- | |||
| | |||
|} | |||