Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

@@ Line 772: / Line 772: @@
 == Aligner: Maskless 04 ==
+<!--
 <span style="background:#FF2800">THIS SECTION IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]
+-->
 [[Image:Heidelberg_uMLA.JPG|300x300px|thumb|Aligner: Maskless 04 is installed in PolyFabLab in building 347.]]
@@ Line 813: / Line 814: @@
 |style="background:LightGrey; color:black"|Exposure mode
 |style="background:WhiteSmoke; color:black" colspan="2"|
-*Projection
+*Projection (Raster mode)
-*Direct laser writing
+*Direct laser writing (Vector mode)
 |-
 | style="background:LightGrey; color:black"|Exposure light
@@ Line 827: / Line 828: @@
 |style="background:LightGrey; color:black"|Minimum structure size
 |style="background:WhiteSmoke; color:black" colspan="2"|
-down to 1µm
+Down to 1µm
 |-
 |style="background:LightGrey; color:black"|Design formats
@@ Line 853: / Line 854: @@
 | style="background:LightGrey; color:black"|Allowed materials
 |style="background:WhiteSmoke; color:black" colspan="2"|
-All PolyFabLab materials
+All PolyFabLab materials with sufficient stiffness and flatness.
 |-
 |style="background:LightGrey; color:black"|Batch