Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano14: Difference between revisions
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| Mask | | Mask | ||
| | | 211 nm zep etched down to 77 nm | ||
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| Line 31: | Line 31: | ||
|- | |- | ||
| Mask | | Mask | ||
| | | 211 nm zep etched down to 77 nm | ||
|- | |- | ||
|} | |} | ||