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Specific Process Knowledge/Thin film deposition/Furnace LPCVD TEOS: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Pevo (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
2,370 edits
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|style="background:LightGrey; color:black"|Film thickness
|style="background:LightGrey; color:black"|Film thickness
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*0 nm - 3000 nm
*Up to 3000 nm
|-
|-
|style="background:LightGrey; color:black"|Step coverage
|style="background:LightGrey; color:black"|Step coverage
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