Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma UV processing: Difference between revisions
| Line 369: | Line 369: | ||
|7/1 2025 | |7/1 2025 | ||
|taran | |taran | ||
|Old sequence (proximity bake by mistake). | |Old sequence (proximity bake and only 60s by mistake). | ||
4" wafer, with HMDS. 9 points on one wafer, exclusion zone 5mm | 4" wafer, with HMDS. 9 points on one wafer, exclusion zone 5mm | ||
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