|
|
| Line 14: |
Line 14: |
|
| |
|
| =Plasma Asher 2= | | =Plasma Asher 2= |
| ''Jitka Urbánková & Jesper Hanberg, December 2019''
| | <span style="color:red">Plasma asher 2 was decommissioned 2024-12-02.</span> |
| [[image:descum_graf.jpg|640px|thumb|Descum results plasma asher 2 - recipe 1]]
| |
|
| |
|
| <span style="color:red">This tool has been decomissioned 2024-12-02.</span>
| | ===[[Specific Process Knowledge/Lithography/Descum/PlasmaAsher2|Information about decommissioned tool]]=== |
| | |
| The user manual(s), quality control procedure(s) and results and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=200 LabManager] - '''requires login'''
| |
| | |
| Descum of AZ Mir 701 resist on 100mm silicon wafer. Five wafers were placed vertically in chamber. | |
| | |
| | |
| '''recipe 1:'''
| |
| *O2 flow: 100 ml/min
| |
| *N2 flow: 100 ml/min
| |
| *Power: 150 W
| |
| {| {{table}}
| |
| | align="center" |
| |
| {|border="1" cellspacing="1" cellpadding="10" style="text-align:left;"
| |
|
| |
| |- style="background:LightGrey"
| |
| |'''Ashing time (min)'''|| 1|| 2 || 3 || 4 || 6 || 7 || 8 || 9 || 10 || 12 || 14 || 15 || 20
| |
| |-
| |
| |'''Etched Thickness (nm)'''|| 8,7 || 5,1 || 12,5 || 6,2 || 31,8 || 86,0 || 25,7 || 46,8 || 38,3 || 49,7 || 59,4 || 140,1 || 360,7
| |
| |-
| |
| |'''Initial temperature (°C)'''|| 28 || 21 || 31 || 21 || 22 || 28 || 25 || 24 || 21 || 24 || 24 || 22 || 22
| |
| |-
| |
| |}
| |
| |}
| |
| | |
| [[image:graf_descum-recipe2.png|640px|thumb|Descum results plasma asher 2 - recipe 2]]
| |
| | |
| | |
| '''recipe 2:'''
| |
| *O2 flow: 500 ml/min
| |
| *N2 flow: 0 ml/min
| |
| *Power: 200 W
| |
| {| {{table}}
| |
| | align="center" |
| |
| {|border="1" cellspacing="1" cellpadding="10" style="text-align:left;"
| |
|
| |
| |- style="background:LightGrey"
| |
| |'''Ashing time (min)'''|| 1 ||2 ||3 ||4 ||5 ||6 ||7 ||8 ||10 ||12 ||15 ||20
| |
| |-
| |
| |'''Etched Thickness (nm)'''||8,1 ||9,4 ||16,8 ||55,2 ||44,0 ||47,5 ||42,5 ||55,1 ||85,3 ||122,4 ||184,8 ||305,9
| |
| |-
| |
| |'''Initial temperature (°C)'''||22 ||21 ||21 ||22 ||22 ||22 ||21 ||21 ||20 ||21 ||21 ||22
| |
| |-
| |
| |}
| |
| |}
| |
| | |
| A linear time dependence was observed after etching 7 minutes or more (recipe 2).
| |
| <br clear="all" />
| |
|
| |
|
| =Plasma Asher 3: Descum= | | =Plasma Asher 3: Descum= |