Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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==Aligner: MA6 - 1== | ==Aligner: MA6-1== | ||
[[Image:KSAligner in E-4.jpg|300x300px|thumb|The Aligner: MA6 - 1 is located in PolyFabLab]] | [[Image:KSAligner in E-4.jpg|300x300px|thumb|The Aligner: MA6-1 is located in PolyFabLab]] | ||
SUSS Mask Aligner MA6 is designed for high resolution photolithography. | SUSS Mask Aligner MA6 is designed for high resolution photolithography. | ||
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===Exposure dose=== | ===Exposure dose=== | ||
[[Specific Process Knowledge/Lithography/Resist#Aligner: MA6 - 1|Information on UV exposure dose]] | [[Specific Process Knowledge/Lithography/Resist#Aligner: MA6-1|Information on UV exposure dose]] | ||
===Process information=== | ===Process information=== | ||
The Aligner: MA6 - 1 has an i-line notch filter installed. This results in an exposure light peak around 365nm with a FWHM of 7nm. | The Aligner: MA6-1 has an i-line notch filter installed. This results in an exposure light peak around 365nm with a FWHM of 7nm. | ||
===Quality Control (QC)=== | ===Quality Control (QC)=== | ||
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*[http://labmanager.dtu.dk/d4Show.php?id=5644&mach=44 The QC procedure for Aligner: MA6 - 1] - '''requires login'''<br> | *[http://labmanager.dtu.dk/d4Show.php?id=5644&mach=44 The QC procedure for Aligner: MA6-1] - '''requires login'''<br> | ||
*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=44 The newest QC data for Aligner: MA6 - 1] - '''requires login''' | *[https://labmanager.dtu.dk/view_binary.php?type=data&mach=44 The newest QC data for Aligner: MA6-1] - '''requires login''' | ||
{| {{table}} | {| {{table}} | ||
| align="center" | | | align="center" | | ||
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{| border="2" cellspacing="1" cellpadding="2" align="center" style="width:400px" | {| border="2" cellspacing="1" cellpadding="2" align="center" style="width:400px" | ||
!QC limits | !QC limits | ||
!Aligner: MA6 - 1 | !Aligner: MA6-1 | ||
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|Nominal intensity | |Nominal intensity | ||