Specific Process Knowledge/Pattern Design: Difference between revisions
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===Alignment marks=== | ===Alignment marks=== | ||
The following alignment marks are suggested to use on the Mask aligners for good pattern recognition. Pleased be adviced that they can be removed in KOH etching. | The following alignment marks are suggested to use on the Mask aligners for good pattern recognition. Pleased be adviced that they can be removed in KOH etching. | ||
*[[Media:Alignmentkeys1.cif|Alignment marks 1 .cif]] (Right click and Use "save link as...") - ''You need the program "Clewin" to open this file'' | *Mask aligner: | ||
*[[Media:Alignmentkeys1.tdb|Alignment marks 1 .tdb]] - ''You need the program "L-Edit" to open this file'' | **[[Media:Alignmentkeys1.cif|Alignment marks 1 .cif]] (Right click and Use "save link as...") - ''You need the program "Clewin" to open this file'' | ||
**[[Media:Alignmentkeys1.tdb|Alignment marks 1 .tdb]] - ''You need the program "L-Edit" to open this file'' | |||
*Maskless aligner: | |||
**[[Media:MLA_AlignmentMarks_simple.gds|Simple alignment marks (.gds)]] | |||
**[[Media:MLA_alignmentMarks_arrows.gds|Alignment marks with structures to assist in locating the marks during alignment (.gds)]] | |||
**[[Media:AlignmentMark_KOH.gds|Alignment mark for multiple layers, Layer 1 for etch in KOH (.gds)]] | |||
====Alignment marks location==== | ====Alignment marks location==== | ||