Specific Process Knowledge/Characterization/XRD: Difference between revisions
| Line 126: | Line 126: | ||
|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"| | ||
Scanning mode | Scanning mode | ||
|style="background:WhiteSmoke; color:black"| | |||
incident / receiver coupled or independent | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
incident / receiver coupled or independent | incident / receiver coupled or independent | ||
| Line 133: | Line 135: | ||
|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"| | ||
Goniomenter radius | Goniomenter radius | ||
|style="background:WhiteSmoke; color:black"| | |||
300 mm | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
300 mm | 300 mm | ||
| Line 140: | Line 144: | ||
|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"| | ||
Minimum step size | Minimum step size | ||
|style="background:WhiteSmoke; color:black"| | |||
0.0001° (0.36") | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
0.0001° (0.36") | 0.0001° (0.36") | ||
| Line 147: | Line 153: | ||
|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"| | ||
Sample stage motion | Sample stage motion | ||
|style="background:WhiteSmoke; color:black"| | |||
*χ:-5~+95° | |||
*φ:0~360° | |||
*Z:-4~+1 mm | |||
*X,Y:±50 mm for a 100 mm wafer | |||
*Rx,Ry:-5~+5° | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*χ:-5~+95° | *χ:-5~+95° | ||
| Line 162: | Line 174: | ||
*Cross Beam Optics(CBO) | *Cross Beam Optics(CBO) | ||
*Ge(220)x2 monochromator | *Ge(220)x2 monochromator | ||
*In-Plane Parallel Slit Collimator (PSC) | |||
*Soller slit | |||
*Automatic variable divergence slit | |||
*Length limiting slits | |||
|style="background:WhiteSmoke; color:black"| | |||
*Cross Beam Optics(CBO) | |||
*Ge(400)x2 monochromator | |||
*In-Plane Parallel Slit Collimator (PSC) | *In-Plane Parallel Slit Collimator (PSC) | ||
*Soller slit | *Soller slit | ||
| Line 178: | Line 197: | ||
*Parallel slit analysers (PSA) | *Parallel slit analysers (PSA) | ||
*Ge(220)x2 analyser | *Ge(220)x2 analyser | ||
|style="background:WhiteSmoke; color:black"| | |||
*Automatic variable scattering slit | |||
*Automatic variable receiver slit | |||
*Parallel slit analysers (PSA) | |||
*Ge(400)x2 analyser | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*0.04° soller slit | *0.04° soller slit | ||
| Line 184: | Line 208: | ||
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | ||
|style="background:LightGrey; color:black"|Measurement temperature | |style="background:LightGrey; color:black"|Measurement temperature | ||
|style="background:WhiteSmoke; color:black"| | |||
Room temperature | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
Room temperature | Room temperature | ||
| Line 190: | Line 216: | ||
|- | |- | ||
|style="background:LightGrey; color:black"|Substrate size | |style="background:LightGrey; color:black"|Substrate size | ||
|style="background:WhiteSmoke; color:black"| | |||
up to 150 mm wafers | |||
Thickness max 21 mm | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
up to 150 mm wafers | up to 150 mm wafers | ||
| Line 202: | Line 232: | ||
No powders or dusty materials. | No powders or dusty materials. | ||
|style="background:WhiteSmoke; color:black"| | |||
All materials have to be approved | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
All materials have to be approved | All materials have to be approved | ||