Specific Process Knowledge/Lithography/EBeamLithography/EBLProcessExamples: Difference between revisions
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*'''Small box approach''': This is illustrated on the right side of the figure. In this approach each circle is represented by a small 2x2 nm box, hence the pattern is an array of these small boxes and the beam pitch is set higher than the size of the box to produce a single beam shot in each box. Again, the size of the resulting circles is determined by the dwell time. | *'''Small box approach''': This is illustrated on the right side of the figure. In this approach each circle is represented by a small 2x2 nm box, hence the pattern is an array of these small boxes and the beam pitch is set higher than the size of the box to produce a single beam shot in each box. Again, the size of the resulting circles is determined by the dwell time. | ||
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| [[image:SingleShot1.png|400px]] || [[image:SingleShot2.png|400px]] || [[image:Singleshot3.png|400px]] | | [[image:SingleShot1.png|400px]] || [[image:SingleShot2.png|400px]] || [[image:Singleshot3.png|400px]] | ||