Specific Process Knowledge/Lithography/EBeamLithography/EBLProcessExamples: Difference between revisions
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Example of the three different approaches for exposing arrays of circles. In all cases the red areas are the areas drawn in the mask file. The small circles indicate beam positions. | |||
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=Article on quality control on the JEOL 9500 system= | =Article on quality control on the JEOL 9500 system= | ||
''' [http://www.sciencedirect.com/science/article/pii/S0167931716300466 Quality control of JEOL JBX-9500FSZ lithography system in a multi-user laboratory]''' | ''' [http://www.sciencedirect.com/science/article/pii/S0167931716300466 Quality control of JEOL JBX-9500FSZ lithography system in a multi-user laboratory]''' | ||