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Specific Process Knowledge/Thermal Process/RTP Jipelec 2: Difference between revisions

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NLAB-Employees-701, NLAB-LabmanagerAllUsers
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NLAB-Employees-701, NLAB-LabmanagerAllUsers
462 edits
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|style="background:Silver; color:black"|Pyro Control
|style="background:Silver; color:black"|Pyro Control
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
* 150 <sup>o</sup>C to 1100 <sup>o</sup>C
* 150 <sup>o</sup>C to 1100 <sup>o</sup>C (Susceptor)
* 400 <sup>o</sup>C to 1100 <sup>o</sup>C (Si-based wafer)
|style="background:WhiteSmoke; color:black;" align="left"|
|style="background:WhiteSmoke; color:black;" align="left"|
|-
|-
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